Physical Electronics (PHI) PHI Genesis

Physical Electronics PHI Genesis is the latest generation of PHI’s highly successful multi-technique XPS product line with PHI’s patented, monochromatic, micro-focused, scanning X-ray source.

It is an easy to use, fully automated system with auto-tuning and calibration and multiple parking positions for high throughput.

The fully integrated multi-technique platform of the PHI Genesis offers an array of optional excitation sources, sputter ion sources, and sample treatment and transfer capabilities. These features are essential in studying today’s advanced materials and in supporting your material characterization and problem-solving needs.

PHI Genesis offers high sensitivity and high throughput for large area and small area down to 5 µm and unique high-throughput non-destructive depth profiling using optional hard X-ray Cr source. The instrument is fully customizable to address all analytical needs.

Intuitive Sample Navigation And Confident Analysis Area Identification

• The unique scanning X-ray microprobe allows SEM like navigation with point-and-click control
• X-ray induced secondary electron imaging (SXI) provides a perfect correlation between imaged areas and spectroscopy
• SmartMosaic for large-area SXI navigation and large area chemical mapping.

The Only Fully Automated High-Throughput Lab-Based Multitechnique XPS/HAXPES Instrument on the Market Commercially Available

• Large sample handling
• Multiple parking positions
• Automated sample transfer and handling
• Fast automated switching between XPS and HAXPES modes

Optimized Depth Profiling

• Multiple ion gun options (monatomic Ar, C60, argon cluster GCIB) for a variety of organic, inorganic, and mixed materials
• 4-axis stage functionality including rotation/tilt and heating/cooling during sputtering
• Multipoint profiling within a single sputter crater for on/off defect analysis and precious samples
• Adjustable solid collection angle for improved angular resolution for Angle-Resolved analysis with advanced software for high-throughput film structure analysis

Superior Micro-Area Analysis

• Highest small area sensitivity on the market
• <5 microns microprobe size in x and y for Al X-ray source and <14 microns for Cr X-ray source
• Image registration for unattended automated micro-area analysis

Bring HAXPES synchrotron capabilities into your lab with the PHI Genesis

• Analytical information depth using the Cr X-ray source is about 3 times deeper than with Al x-ray source
• Probing thicker film structures and buried interfaces, minimizing the effects of surface contamination and ion-induced chemical damage during depth profiling

Suite Of Specialized Solutions For In Situ Characterization Of Advanced Materials

• Electronic band structure of organic and inorganic materials using UPS, LEIPS, REELS measurement from the same sample location
• Electrochemical (biasing, polarization studies) experiments
• Inert sample transfer vessel
• Fully integrated high energy and high spatial resolution Auger Spectroscopy with elemental mapping at the exact location of interest as XPS