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PELCO® Tripod Polisher™ 590TEM, 590SEM & 590TS

The PELCO® Tripod Polisher™ 590 was designed by researchers at IBM to accurately prepare TEM and SEM samples of pre-specified, micron-sized regions. For TEM samples, this technique has been used successfully to limit ion milling times to less than 15 minutes and, in some cases, has eliminated the need for ion milling. Although this technique was designed […]

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The PELCO® Tripod Polisher™ 590 was designed by researchers at IBM to accurately prepare TEM and SEM samples of pre-specified, micron-sized regions. For TEM samples, this technique has been used successfully to limit ion milling times to less than 15 minutes and, in some cases, has eliminated the need for ion milling. Although this technique was designed for preparing semiconductor cross-sections, it has been used to prepare both plan-view and cross-section samples from such diverse materials as ceramics, composites, metals, and geological samples.

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